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Found 1 from your keywords: author="Bei Yu"
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Design for manufacturability with advanced lithography
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Bei YuDavid Z. Pan

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, …

Edition
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ISBN/ISSN
9783319203850
Collation
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Series Title
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Call Number
621.319