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Chemical Vapor Deposition


This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.


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Detail Information
Series Title
-
Call Number
-
Publisher
: ., 2016
Collation
-
Language
ISBN/ISSN
9789535141877
Classification
NONE
Content Type
text
Media Type
computer
Carrier Type
online resource
Edition
-
Subject(s)
-
Specific Detail Info
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Statement of Responsibility
Neralla, Sudheer
Other Information
Cataloger
B.Siti
Source
-
Validator
-
Digital Object Identifier (DOI)
10.5772/61559
Journal Volume
-
Journal Issue
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Subtitle
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Parallel Title
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  • Chemical Vapor Deposition
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