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Found 1 from your keywords: author=Jiménez, Carmen
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Chapter Spatial Atomic Layer Deposition
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Jiménez, Carmen

In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept apart by an inert gas region or zone. Film growth is achieved by exposing the substrate to the loc…

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